US Patent Issued to Tokyo Electron on Sept. 30 for "Filter cleaning system and filter cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,427,551, issued on Sept. 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Filter cleaning system and filter cleaning method" was invented by Yuki Otsuka (Kumamoto, Japan), Atsushi Anamoto (Kumamoto, Japan) and Hiroshi Komiya (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A filter cleaning system includes a storage unit that stores liquid that is passed through a filter; a liquid supply path that sends the liquid stored in the storage unit to the filter; a circulation path that returns the liquid sent from the filter to the storage unit; a first supply unit that supplies a first liquid to the storage unit; and a second supply unit that...