US Patent Issued to Tokyo Electron on Sept. 23 for "Systems and methods for determining a localized fluid velocity on a spinning substrate by tracking movement of a tracer across the spinning substrate" (Texas, New York Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,467, issued on Sept. 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Systems and methods for determining a localized fluid velocity on a spinning substrate by tracking movement of a tracer across the spinning substrate" was invented by Michael Carcasi (Austin, Texas), Sean Berglund (Austin, Texas), Ankur Agarwal (Austin, Texas) and Steven Gueci (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods are provided to control operational parameter(s) of a spin-on process based on a localized fluid velocity of a processing liquid dispensed onto a surface of a spinning semiconductor substrate. In the present disclosure, a trac...