US Patent Issued to Tokyo Electron on Sept. 23 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,423, issued on Sept. 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus" was invented by Atsushi Sawachi (Miyagi, Japan), Jun Hirose (Miyagi, Japan), Takuya Nishijima (Miyagi, Japan), Ichiro Sone (Miyagi, Japan) and Suguru Sato (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a first chamber having an inner space and an opening, a substrate support disposed in the inner space of the first chamber, an actuator configured to move the substrate support between a first position and a second position, a second chamber that is disposed in the inner space of the first cha...