US Patent Issued to Tokyo Electron on Sept. 2 for "Vacuum processing apparatus and oxidizing gas removal method" (Japanese, American Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,406,862, issued on Sept. 2, was assigned to Tokyo Electron Ltd. (Tokyo).

"Vacuum processing apparatus and oxidizing gas removal method" was invented by Hirokazu Ueda (Yamanashi, Japan), Yoji Iizuka (Tokyo), Mitsuaki Iwashita (Yamanashi, Japan), Antonio Rotondaro (Austin, Texas), Dipak Aryal (Austin, Texas), Takeo Nakano (Yamanashi, Japan), Ryuichi Asako (Yamanashi, Japan), Kenji Sekiguchi (Yamanashi, Japan), Koji Akiyama (Yamanashi, Japan), Naoki Umeshita (Tokyo) and Takashi Hayakawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vacuum processing apparatus includes a decompressable process container; a supply port configured to supply, to the ...