US Patent Issued to Tokyo Electron on Sept. 16 for "Processing method and substrate processing system" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,082, issued on Sept. 16, was assigned to Tokyo Electron Ltd. (Tokyo).

"Processing method and substrate processing system" was invented by Satoshi Wakabayashi (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A processing method is implemented in a substrate processing system. The system includes: a processing container including a stage on which a substrate is placed; an attachment portion to which a raw material container is detachably attached; a heater configured to produce a raw material gas; a carrier gas supplier configured to supply a carrier gas to the raw material container; a supply line configured to supply the raw material...