US Patent Issued to Tokyo Electron on Oct. 7 for "Substrate processing system and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,410, issued on Oct. 7, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and substrate processing method" was invented by Koji Maeda (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a substrate processing system comprising: a plurality of transfer modules having transfer mechanisms configured to transfer substrates; and a plurality of process modules connected to the plurality of transfer modules. The transfer mechanisms of the plurality of transfer modules transfer a plurality of substrates sequentially and serially to the plurality of process modules, and each of the plurality of transfer mo...