ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,438,025, issued on Oct. 7, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing system" was invented by Dongwei Li (Nirasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system comprises a module having a mounting unit on which a substrate is mounted, a transfer chamber connected to the module, and a substrate transfer device disposed in the transfer chamber and configured to transfer the substrate to the module. The substrate transfer device includes a transfer unit having a substrate holder and a base that has therein a magnet and moves the substrate holder along a bottom portion of the transfer chamber, an...