ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,427, issued on Oct. 7, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing method and storage medium" was invented by Shogo Inaba (Koshi, Japan) and Masatoshi Kawakita (Koshi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus for forming a coating film on a peripheral edge portion including a peripheral edge of a front surface and a side surface of a substrate, includes: a substrate holder for rotatably holding the substrate; a first chemical liquid supplier for supplying a first chemical liquid onto the peripheral edge including a rear surface of the substrate; a partial removing part for removing t...