ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,972, issued on Oct. 7, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Masaki Hirayama (Fuchu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes: a chamber having a processing space therein; a substrate support provided inside the processing space; an upper electrode provided above the substrate support with the processing space interposed therebetween; an emitter provided to emit electromagnetic waves into a plasma generation space and extending in a circumferential direction around a central axis of the chamber and the processing space; and a waveguide configured t...