US Patent Issued to Tokyo Electron on Oct. 28 for "Plasma processing system, plasma processing apparatus, and method for replacing edge ring" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,613, issued on Oct. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing system, plasma processing apparatus, and method for replacing edge ring" was invented by Kazuki Moyama (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a processing chamber, a support in the processing chamber to support an edge ring assembly that includes a heat transfer sheet that is attached to an edge ring, and the edge ring surrounding the substrate supported by support, and a delivery structure for vertically moving and transferring the edge ring assembly between the plasma processing apparatus and the pre...