US Patent Issued to Tokyo Electron on Oct. 28 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,609, issued on Oct. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Taro Ikeda (Nirasaki, Japan), Satoru Kawakami (Nirasaki, Japan) and Kenta Kato (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes: a processing container including a substrate support; a shower head that supplies active species of a first gas into the processing container; a first dissociation space through which the active species is supplied to the shower head; and a resonator that supplies electromagnetic waves in a VHF band or higher to the first dissociation space. The resonator i...