US Patent Issued to Tokyo Electron on Oct. 28 for "Method for removing material overburden via enhanced freeze-less anti-spacer formation using a bilayer system" (New York, Massachusetts Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,507, issued on Oct. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method for removing material overburden via enhanced freeze-less anti-spacer formation using a bilayer system" was invented by Charlotte Cutler (Hopkinton, Mass.) and Michael Murphy (Latham, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques herein include methods of patterning a substrate using surface energy differences found in some fluorinated polymers or polymers with long chain alkyl functionality that promotes surface or top layer segregation in a bilayer polymer system to facilitate overburden removal when the polymer mixture is deposited over a relief pattern....