US Patent Issued to Tokyo Electron on Oct. 28 for "Metalorganic films for extreme ultraviolet patterning" (California Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,504, issued on Oct. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Metalorganic films for extreme ultraviolet patterning" was invented by Robert Clark (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate that includes: forming, over the substrate placed in a process chamber, an extreme ultraviolet (EUV)-active photoresist film including a tin alkenoxide moiety by exposing the substrate to a tin-containing precursor and exposing the substrate to an oxygen-containing precursor that reacts with the tin from the tin-containing precursor to form the tin alkenoxide; and patterning the EUV-active photoresist...