US Patent Issued to Tokyo Electron on Oct. 28 for "Heat treatment apparatus, control method, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,757, issued on Oct. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Heat treatment apparatus, control method, and storage medium" was invented by Morihito Inagaki (Yamanashi, Japan), Takuya Higuchi (Iwate, Japan) and Hideomi Hane (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A heat treatment apparatus includes a control device. The control device includes a heat treatment control unit that controls a heat treatment performed on a processing target accommodated in a processing container, according to a process condition, a cleaning control unit that controls a cleaning process on deposits adhering to the processing container due ...