US Patent Issued to Tokyo Electron on Oct. 21 for "Plasma processing apparatus with tunable electrical characteristic" (American, Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,329, issued on Oct. 21, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus with tunable electrical characteristic" was invented by Peter Lowell George Ventzek (Austin, Texas), Mitsunori Ohata (Taiwa-cho, Japan), Alok Ranjan (Austin, Texas) and Yun Han (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a plasma processing chamber, a source power coupling element configured to generate plasma in an interior of the plasma processing chamber by coupling source power to the plasma processing chamber, a DC pulse generator configured to generate a DC pulse train at a DC pulse frequency...