US Patent Issued to Tokyo Electron on Oct. 21 for "Gas cabinet with reduced gas emissions and exhaust flow rate" (New York Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,513, issued on Oct. 21, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas cabinet with reduced gas emissions and exhaust flow rate" was invented by Ronald Nasman (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of improved gas cabinets and associated methods are provided herein to reduce diffusion of process gas outside of a gas cabinet. In the disclosed embodiments, a gas cabinet is provided with: (a) an exhausted enclosure for housing at least one gas vessel (containing a process gas) and associated gas distribution components within an interior of the enclosure, (b) an air intake vent for drawing ambient air from outside o...