ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,327, issued on Oct. 21, was assigned to Tokyo Electron Ltd. (Tokyo).
"Apparatus for plasma processing" was invented by Yohei Yamazawa (Tokyo), Kazuki Moyama (Taiwa-cho, Japan), Barton Lane (Austin, Texas) and Merritt Funk (Austin, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "An antenna includes an inner structure, an outer structure, and a plurality of interconnecting structures coupling the inner structure to the outer structure. The plurality of interconnecting structures is axisymmetric with respect to a center of the antenna. Each interconnecting structure has an azimuthal component of at least 30 degrees."
The patent was filed on Feb. ...