US Patent Issued to Tokyo Electron on Oct. 14 for "System of processing substrate, transfer method, transfer program, and holder" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,632, issued on Oct. 14, was assigned to Tokyo Electron Ltd. (Tokyo).

"System of processing substrate, transfer method, transfer program, and holder" was invented by Masahiro Numakura (Miyagi, Japan), Toshiaki Toyomaki (Miyagi, Japan), Seiichi Kaise (Miyagi, Japan) and Yuki Takeyama (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system of processing a substrate includes an atmospheric-pressure transfer chamber, at least one vacuum processing chamber, at least two load-lock modules, a vacuum transfer chamber, a plurality of load ports, and a first transfer mechanism and a second transfer mechanism. The load ports are attached to the a...