US Patent Issued to Tokyo Electron on Oct. 14 for "Substrate processing system and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,623, issued on Oct. 14, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and substrate processing method" was invented by Keita Hirase (Kumamoto, Japan), Yukiyoshi Saito (Kumamoto, Japan), Akihiro Teramoto (Kumamoto, Japan), Koji Tanaka (Kumamoto, Japan), Shota Takei (Kumamoto, Japan), Masataka Gosho (Kumamoto, Japan), Kazuaki Kitamura (Kumamoto, Japan), Shinichi Ikeda (Kumamoto, Japan), Shunsuke Kurizaki (Kumamoto, Japan) and Yuji Kimura (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes: a carry-in/out section in which a cassette accommodating a plurality of substrates is...