ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,574, issued on Oct. 14, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus, and plasma processing method" was invented by Taro Ikeda (Nirasaki, Japan), Mitsutoshi Ashida (Nirasaki, Japan) and Eiki Kamata (Nirasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing apparatus comprising: a processing container configured such that a substrate is subjected to plasma processing; a dielectric top plate which is quadrangular and which is provided to close an upper opening of the processing container; and a conductor plate supporting the dielectric top plate and having four electromagnetic wav...