US Patent Issued to Tokyo Electron on Nov. 4 for "Substrate processing system and method of estimating height of annular member" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,212, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and method of estimating height of annular member" was invented by Toshiaki Kodama (Nirasaki, Japan), Shinji Wakabayashi (Nirasaki, Japan), Takehiro Shindo (Nirasaki, Japan) and Tatsuru Okamura (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes: a substrate processing apparatus including a stage on which a substrate and an annular member are placed; a substrate transport mechanism including a substrate holder; a distance sensor provided in the substrate holder; and a control device, wherein the substrate t...