ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,084, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).
"Shower head and substrate processing apparatus" was invented by Hachishiro Iizuka (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a shower head disposed in a processing container where a substrate is accommodated and configured to discharge a gas to the substrate in a shower pattern, comprising: a main body portion having a facing surface facing a stage disposed in the processing container to place the substrate thereon; a covering section that covers a surface formed on an opposite side of the facing surface of the main body portion, and forms, be...