ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,013, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Taro Ikeda (Nirasaki, Japan), Yuki Osada (Nirasaki, Japan) and Hiroyuki Miyashita (Nirasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes: a processing container; a resonator configured to resonate electromagnetic waves to be supplied; a slot antenna connected to the resonator; and a transmission window configured to transmit the electromagnetic waves radiated from the slot antenna and supply the electromagnetic waves into the processing container, wherein the resonator includes: an input por...