ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,025, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Kazuki Moyama (Miyagi, Japan) and Yuzuru Sakai (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a plasma processing chamber; a substrate support disposed in the plasma processing chamber; a movable member and a stationary member each disposed around the substrate support, the movable member having a plurality of moving blades, the plurality of moving blades being rotatable, the stationary member having a plurality of stationary blades, the plurality of moving blades and the plurality of ...