US Patent Issued to Tokyo Electron on Nov. 4 for "Methods to automatically adjust one or more parameters of a camera system for optimal 3D reconstruction of features formed within/on a semiconductor substrate" (Minnesota, New York Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,462,375, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"Methods to automatically adjust one or more parameters of a camera system for optimal 3D reconstruction of features formed within/on a semiconductor substrate" was invented by Mirko Vukovic (Albany, N.Y.) and Ryan Lloyd (Chaska, Minn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of systems and methods are disclosed for inspecting features formed within and/or on a semiconductor substrate. More specifically, the present disclosure provides various embodiments of systems and methods to automatically adjust one or more parameters (or camera settings) used by a camera syst...