US Patent Issued to Tokyo Electron on Nov. 4 for "Control device, substrate processing system, and method of controlling vacuum valve device" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,060, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"Control device, substrate processing system, and method of controlling vacuum valve device" was invented by Takuya Yamamoto (Yamanashi, Japan) and Takashi Sugimoto (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is a control device for controlling a vacuum valve device which includes a valve body configured to open and close a transfer path through which a first chamber and a second chamber communicate with each other, a seal member provided in the valve body, and a valve body driver having a motor and configured to drive the valve body, wherein the control de...