US Patent Issued to Tokyo Electron on Nov. 4 for "Cleaning method, computer storage medium, and substrate treatment system" (Idaho Inventor)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,455, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"Cleaning method, computer storage medium, and substrate treatment system" was invented by Hayato Kikuchi (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for cleaning a supply flow path connected to a discharger which discharges a treatment solution to a substrate, includes: (A) supplying a cleaning solution to the discharger via the supply flow path and discharging the cleaning solution from the discharger; and (B) estimating whether or not cleaning has been completed, based on a detection result by a foreign substance detector configured to detect foreign subs...