US Patent Issued to Tokyo Electron on Nov. 25 for "Substrate processing apparatus and shutter" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,638, issued on Nov. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and shutter" was invented by Takashi Aramaki (Miyagi, Japan), Kojiro Matsuzaka (Miyagi, Japan), Atsushi Ogata (Miyagi, Japan), Lifu Li (Miyagi, Japan) and Gyeong Min Park (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus comprises a substrate support disposed in the chamber, a shutter including a valve body configured to open and close an opening of the chamber, and a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at ...