ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,663, issued on Nov. 25, was assigned to Tokyo Electron Ltd. (Tokyo).
"Processing apparatus" was invented by Akinobu Kakimoto (Yamanashi, Japan), Yoshinobu Hayakawa (Miyagi, Japan), Satoshi Mizunaga (Iwate, Japan), Yasuhiro Hamada (Yamanashi, Japan) and Mitsuhiro Okada (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A processing apparatus includes a first chamber having a gas first inlet and a first gas outlet, a plasma generator that generates a plasma in the first chamber, and a second chamber having a second gas inlet and a second gas outlet. A control unit controls the first inlet to provide a carbon containing gas to the...