ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,631, issued on Nov. 25, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Masaki Hirayama (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a temperature regulator, which includes a plurality of fans and provides a flow path, wherein the flow path is axially or rotationally symmetrical with respect to a central axis and includes a first partial flow path and a second partial flow path, and wherein the first partial flow path extends along an upper surface of an excitation electrode, and the second partial flow path extends alternately in opposite directions between t...