ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,110, issued on Nov. 18, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing module" was invented by Takashi Yamauchi (Kumamoto, Japan), Shinichiro Kawakami (Kumamoto, Japan) and Masashi Enomoto (Kumamoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A technique for suppressing a metal component from remaining at a bottom of a mask pattern when the mask pattern is formed using a metal-containing resist film. A developable anti reflection film 103 is previously formed below a resist film 104. Further, after exposing and developing the wafer W, TMAH is supplied to the wafer W to remove a surface of the anti-reflection film 103 fa...