US Patent Issued to Tokyo Electron on Nov. 18 for "Plasma processing apparatus, power supply system, control method, program, and storage medium" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,080, issued on Nov. 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus, power supply system, control method, program, and storage medium" was invented by Gen Tamamushi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a plasma processing apparatus, electrical bias energy is provided from a bias power supply to a substrate support. Source radio-frequency power is provided from a radio-frequency power supply to a radio-frequency electrode through a feed line. A phase period having a minimum value of a power level of a reflected wave of the source radio-frequency power is identified from a plurality of phase pe...