ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,115, issued on Nov. 18, was assigned to Tokyo Electron Ltd. (Tokyo).
"Method for processing workpiece" was invented by Masahiro Tabata (Miyagi, Japan), Toru Hisamatsu (Miyagi, Japan), Yoshihide Kihara (Miyagi, Japan) and Masanobu Honda (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In an embodiment, in the method for processing a workpiece including an etching target layer containing silicon oxide, a mask provided on the etching target layer, and an opening provided in the mask and exposing the etching target layer, according to the embodiment, the etching target layer is etched by removing the etching target layer for each atomic lay...