US Patent Issued to Tokyo Electron on Nov. 18 for "Electrostatic chuck and method of operation for plasma processing" (American, Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,091, issued on Nov. 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Electrostatic chuck and method of operation for plasma processing" was invented by Melvin Verbaas (Austin, Texas) and Einosuke Tsuda (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electrostatic chuck (ESC) for holding a workpiece in a plasma processing chamber, where the ESC includes a monolithic insulating substrate with a top surface; a plurality of electrodes embedded in the insulating substrate, the plurality of electrodes being in a multipolar configuration to receive multiple DC bias signals from a first power supply circuit; and a radio frequency (RF) el...