US Patent Issued to Tokyo Electron on Nov. 11 for "Substrate support, plasma processing apparatus, and ring replacement method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,738, issued on Nov. 11, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate support, plasma processing apparatus, and ring replacement method" was invented by Shin Matsuura (Miyagi, Japan), Nobutaka Sasaki (Miyagi, Japan) and Gyeong min Park (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is a substrate support comprising: a substrate supporting portion; a first ring disposed to surround the substrate supporting portion; a second ring surrounding the first ring without overlapping the first ring in plan view; a third ring disposed below the first ring and the second ring such that an inner portion of the third ring overlaps t...