US Patent Issued to Tokyo Electron on Nov. 11 for "Substrate processing apparatus and abnormality detection method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,723, issued on Nov. 11, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and abnormality detection method" was invented by Hiroaki Chihaya (Nirasaki, Japan), Tetsuya Miyashita (Nirasaki, Japan), Einstein Noel Abarra (Fuchu, Japan) and Yasuhiko Kojima (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a stage having an electrostatic chuck configured to attract a substrate; a measurement part configured to measure a temperature of the stage; and a detection part configured to detect an abnormality caused by attraction of the substrate by the electrostatic chuck, based ...