ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,903, issued on May 6, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate support and plasma processing apparatus" was invented by Hajime Tamura (Miyagi, Japan), Yasuharu Sasaki (Miyagi, Japan), Shin Yamaguchi (Miyagi, Japan), Tsuguto Sugawara (Miyagi, Japan) and Katsuyuki Koizumi (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed substrate support includes a first region, a second region, a first electrode, and a second electrode. The first region is configured to hold a substrate placed thereon. The second region is provided to surround the first region and configured to hold an edge ring placed thereon. The first elec...