US Patent Issued to Tokyo Electron on May 6 for "Plasma processing apparatus and mounting table thereof" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,937, issued on May 6, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and mounting table thereof" was invented by Yohei Uchida (Miyagi, Japan) and Jun Hirose (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mounting table includes a wafer mounting surface mounting a wafer, a ring mounting surface disposed at a radially outer side of the wafer mounting surface and mounting a first ring having a first engaging portion and a second ring having a second engaging portion to be engaged with the first engaging portion, a lifter pin, and a driving mechanism. The second ring has a through-hole extends to reach a botto...