US Patent Issued to Tokyo Electron on May 27 for "Treatment condition setting method, storage medium, and substrate treatment system" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,314,023, issued on May 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Treatment condition setting method, storage medium, and substrate treatment system" was invented by Takuya Mori (Tokyo), Tadashi Nishiyama (Koshi, Japan), Akiko Kiyotomi (Koshi, Japan) and Hiroshi Tomita (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "This method includes, in a substrate treatment system, acquiring an image of a reference substrate which is a reference for condition setting; and acquiring an image of a treated substrate on which the predetermined treatment has been performed under a first treatment condition. A deviation amount in information between t...