US Patent Issued to Tokyo Electron on May 27 for "Substrate treatment apparatus and transfer schedule creation method" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,752, issued on May 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate treatment apparatus and transfer schedule creation method" was invented by Kenichirou Matsuyama (Koshi, Japan) and Yuichiro Kawasaki (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treatment apparatus includes: treatment parts each of which performs a predetermined treatment; and a transfer mechanism which transfers a transfer object. Transfer objects are transferred in a predetermined transfer-in order into the substrate treatment apparatus. The substrate treatment apparatus includes a controller which acquires a process job. The controller deter...