US Patent Issued to Tokyo Electron on May 27 for "Substrate transfer device and substrate transfer method" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,184, issued on May 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate transfer device and substrate transfer method" was invented by Tatsuhiko Tsujihashi (Kumamoto, Japan), Suguru Enokida (Kumamoto, Japan) and Kazuki Matsushita (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate transfer device includes a substrate holder and a base to which the substrate holder is movably attached. The substrate holder includes first and second suction holes provided to be open in a placing surface, first and second protrusions disposed respectively in the first and second suction holes, and first and second supports provided respec...