ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,700, issued on May 27, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus and ceiling wall" was invented by Satoshi Itoh (Yamanashi, Japan), Masashi Imanaka (Yamanashi, Japan), Eiki Kamata (Yamanashi, Japan), Taro Ikeda (Yamanashi, Japan), Shigenori Ozaki (Osaka, Japan) and Soudai Emori (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing apparatus that converts a gas supplied into a processing container into a plasma to process a substrate, the plasma processing apparatus including: a microwave introduction window disposed in each of a plurality of openings formed in a ceiling...