ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,702, issued on May 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Takaki Kobune (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a cylindrical chamber defining a processing space in which a substrate is processed, and a member constituting an outer circumference of the cylindrical chamber. The member includes at least one flow path inlet configured to allow a heat transfer medium to flow in therethrough, at least one flow path outlet configured to allow the heat transfer medium to flow out therethrough, at least one flow path connecting the flow path ...