US Patent Issued to Tokyo Electron on May 27 for "Method of performing maintenance on substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,709, issued on May 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method of performing maintenance on substrate processing apparatus" was invented by Yuya Minoura (Miyagi, Japan), Takayuki Suzuki (Miyagi, Japan) and Takahiro Murakami (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of performing maintenance on a substrate processing apparatus is provided. The substrate processing apparatus includes a chamber and a gas supplier configured to supply a processing gas to an interior of the chamber. The method includes (a) supplying a first processing gas from the gas supplier to the interior of the chamber, and forming a protect...