ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,113, issued on May 20, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate inspection apparatus, substrate inspection method, and recording medium" was invented by Takahiro Yamaguchi (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate inspection apparatus configured to inspect a substrate by using an image of a surface of the substrate includes a holder configured to hold the substrate; a first light source unit configured to emit visible light to the substrate; a second light source unit configured to emit ultraviolet light to the substrate; a first imaging sensor configured to perform capturing of a visible light image of ...