US Patent Issued to Tokyo Electron on May 20 for "Optical emission spectroscopy for advanced process characterization" (New York, California Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,044, issued on May 20, was assigned to Tokyo Electron Ltd. (Tokyo).

"Optical emission spectroscopy for advanced process characterization" was invented by Sergey Voronin (Albany, N.Y.), Blaze Messer (Albany, N.Y.), Yan Chen (Fremont, Calif.), Joel Ng (Fremont, Calif.), Ashawaraya Shalini (Fremont, Calif.), Ying Zhu (Fremont, Calif.) and Da Song (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of characterizing a plasma in a plasma processing system that includes: generating a pulsed plasma in a plasma processing chamber of the plasma processing system, the pulsed plasma being powered with a pulsed power signal, each pulse of the ...