ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,524, issued on May 13, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing system" was invented by Yoshifumi Amano (Koshi, Japan), Satoshi Morita (Koshi, Japan), Ryoji Ikebe (Koshi, Japan) and Isamu Miyamoto (Koshi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement processing process S103 of measuring a cut width of a film based on an image obtained by imaging, with an imaging unit 270, a peripheral portion of a substrate which is processed based on a substrate processing recipe; a creation process S602 of creating a management list in which a set value of the cut width of the film, a measurement value of the cut widt...