US Patent Issued to Tokyo Electron on May 13 for "Stage, plasma processing apparatus, and cleaning method" (Japanese Inventor)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,471, issued on May 13, was assigned to Tokyo Electron Ltd. (Tokyo).

"Stage, plasma processing apparatus, and cleaning method" was invented by Takahiro Senda (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A stage including a mounting section and an adhesive layer is provided. The mounting section is disposed in a plasma space, and a substrate is placed on the mounting section. The adhesive layer bonds the mounting section to a base. A through-hole penetrating the mounting section, the base, and the adhesive layer is formed in the stage. The through-hole is configured to supply a heat transfer gas. The stage includes a sleeve member pro...