ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,469, issued on May 13, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus, calculation method, and calculation program" was invented by Shinsuke Oka (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a plasma processing apparatus, a mounting table includes a heater for adjusting a temperature of a mounting surface mounting thereon a consumable part consumed by plasma processing. A heater control unit controls a supply power to the heater such that the heater reaches a setting temperature. A measurement unit measures, while controlling the supply power to the heater such that the temperature of the heater becomes ...