ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,468, issued on May 13, was assigned to Tokyo Electron Ltd. (Tokyo).
"Method of uniformity control" was invented by Shyam Sridhar (Austin, Texas), Ya-Ming Chen (Austin, Texas), Peter Lowell George Ventzek (Austin, Texas), Mitsunori Ohata (Taiwa-cho, Japan) and Alok Ranjan (Austin, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate that includes: loading the substrate in a plasma processing chamber, the substrate including an underlying layer; maintaining a steady state flow of a process gas into the plasma processing chamber in the plasma processing chamber; generating a plasma in the plasma processing chamber; ex...